Atomic Layer Deposition Systems
Dual chamber hot-wall reactors for both research and production.
RF and End Hall Ion Sources
Ion sources for cleaning, densification and etching of materials.
Thin Film Deposition and Etching Systems
Systems for PVD, ion beam etching, DLC and optical fiber metalization.
Pulsed Laser Deposition Systems
Deposition equipment for next generation thin film applications.
Rapid Thermal Processing Systems
Benchtop atmospheric systems with dual-side heating to 1200 degrees C for 4", 6" and 8" wafers.
Spector Ion Beam Deposition System
Dual ion beam deposition systems for high quality films.