Atomic Layer Deposition Systems

Dual chamber hot-wall reactors for both research and production.

RF and End Hall Ion Sources

Ion sources for cleaning, densification and etching of materials.


Thin Film Deposition and Etching Systems

​Systems for PVD, ion beam etching, DLC and optical fiber metalization.


Pulsed Laser Deposition Systems

Deposition equipment for next generation thin film applications.

​   ​      LABTEC SALES

Rapid Thermal Processing Systems

Benchtop atmospheric systems with dual-side heating to 1200 degrees C for 4", 6" and 8" wafers.

Spector Ion Beam Deposition System

Dual ion beam deposition systems for high quality films.