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.AGS offers a complete range of plasma processing systems for a variety of etching and deposition applications; including Plasma Etch, RIE, ICP, PECVD and single & multi-target PVD in either single or multi chamber configurations
       AIO International is a cost effective processing equipment provider for the semiconductor industry. AIO specializes in CVD/PVD/Etchers, Evaporators/Sputters, Spin Tracks and Dispense Systems. AIO also has complete line of photoresist pumps.
       The heart of IMP is the SF-100 Maskless Patterning System, which allows fast patterning on a variety of flat and curved substrates with patterns down to 5 microns. Systems are available in manual, auto-stage and cassette-to-cassette.
      The RTP system designed by SSI is ideal for R&D and pre-production.  The Solaris 150 can process up to 150mm substrates at a temperature range from RT-1250 degrees.  SSI also offers a wafer ID exposure system designed for glass and compund semiconductor substrates that are susceptible to stress cracks and particle contamination.
       Veeco supplies the widest range of ion sources for the broadest variety of applications. Including RF and DC gridded and gridless end hall configurations. The Mark II + source and power supply provide lower maintenance and greater performance than other end hall sources.